-
2022/09/28（水)
NewsWe will start selling general-purpose high temperature heating mechanism.
-
2022/09/14（水)
News13-17, November, 2022 Nagoya , Japan We will exhibit in cooperation with the 33rd International Photovoltaic Science and Engineering Conference in Japan.
-
2022/09/14（水)
News8-10, November,2022 Fukuoka, Japan We will exhibit in cooperation with the 63rd Battery symposium in Japan.
-
2021/06/11（金)
News2021 ７ We are planning to sponsor the 18th HWCVD and place a comprehensive product advertisement.
-
2020/02/02（日)
NewsWe participated in the 3rd lecture of the Japan Society of Applied Physics Kansai Branch in Fy2019 and exhibited the LEIPS system advertisement.
-
2019/06/11（火)
NewsWe have announced and started selling the AGB series of our own brand glove box.
-
2016/09/08（木)
NewsWe will exhibit at 2016 ICFPE. We will exhibit at the International Conference 2016 ICFPE (International Canference on Flexible and Printed Electronics, 2016/9 / 6-9 / 8) held at Yamagata University.We look forward to welcoming everyone. For more information on 2016 ICFPE, please visit http://www.2016icfpe.org
-
2016/09/08（木)
We will exhibit at 2016 ICFPE. We will exhibit at the International Conference 2016 ICFPE (International Canference on Flexible and Printed Electronics
-
2016/09/01（木)
NewsWe decided to strengthen the business of dedicated sputtering equipment in addition to the conventional combined sputtering equipment, and in collaboration with INFOVION, which has a base in Seoul, South Korea, we will sell the excellent sputtering equipment of the company to the Japanese market. We decided to deploy it.As a Korean vacuum equipment manufacturer, Infobion has advanced technology in its own technology for handling ions and electrons, such as developing an ion source for thin film surface modification in-house. The product group is also a small sputtering device for university research, ion. In addition to beam sputtering, we handle a wide range of medium- and large-scale in-line equipment and cluster equipment.
［General purpose 600℃ high temperature heating mechanism］It is possible to control substrate high temperature heating during film formation by installing it in evaporation system , sputtering system, etc.Useful for evaluation of crystallinity, arrangement, modification, etc.
