Rotary Kelvin Probe System RKP-1
Achieve high-precision, real-time measurement of work function and surface potential!
Main Applications
Work function (Fermi level) measurement on clean metal and semiconductor surfaces
Real-time measurement of surface potential during organic semiconductor film deposition
Features
● High-resolution measurement using a high-precision rotating electrode
● Vacuum compatible: Enables stable measurement unaffected by atmospheric conditions
● Achieves real-time work function and surface potential measurement during film deposition, difficult with vibrating electrodes
● Capable of evaluating band bending at heterointerfaces and orientation polarization in polar molecularly deposited films
● User-friendly measurement software
Supports data acquisition for temperature, pressure, etc.
Basic Configuration
Basic Specifications
| Item | Specifications |
|---|---|
| Rotating Electrode Unit Dimensions | W105mm×D80mm×H75mm |
| Measuring board | Measuring board: 10 mm×20 mm （measuring section: 10 mm×10 mm） |
| Rotating （Reference）Electrode | Material: SUS-304 2-bladed（30degs×2）Rotation speed: 0–30 [rpm] |
| Exertion | AC100V 15A |
Options
● Installation and control compatibility with vacuum equipment and other devices
● Integration of other data into RKP measurement data (film thickness data, pressure data, etc.)
● Custom rotary electrode solutions
※RKP-1 was commercialized under the technical guidance of the Ishii Laboratory （Professor Hisao Ishii, Dr. Masahiro Ohara） at the Center for Advanced Science, Chiba University, a National University Corporation.
Contact Us
Please feel free to contact us via the form below for any inquiries or questions.
